GL8 CLlV Gen2 is the GermanLitho latest semi-automatic full-field, high-resolution UV nanoimprint equipment. The GermanLitho proprietary CLIV (Contact Litho into Vacuum) technology ensures the accuracy of imprinted structures and replication fidelity.
GL8 CLIV Gen2 enables semi-automatic imprinting of high resolution (better than 10nm*) and high aspect ratio (better than 10 : 1*) nanostructures on up to 200mm wafers. The equipment supports automatic replication of flexible composite working stamps, which has high resolution and long service life. Using working stamps can significantly reduce the cost of large-area molds in nanoimprint processes. GL8 CLIV Gen2 is suitable for R&D and pilot production of DOE, AR / VR waveguide (including slanted gratings), WGP, metalens, biochip, LED PSS, MLA and other applications.
Volume-proven full-filed nanoimprint equipment for high resolution, high aspect ratio nanostructures on up to 200mm wafers.
CLIV imprinting technology ensures the accuracy of imprinted structures and replication fidelity.
Automatic replication of flexible composite working stamp in the equipment, reducing the cost of large-area molds in nanoimprint processes.
Fully automatic process including working stamp replication, alignment, imprinting, curing and separation, etc..
High power UV LED panel light source (365nm, light intensity >1000mW/cm2) with water cooling, possible customization of power and wavelength of the light source, perfectly support a variety of commercial nanoimprint materials.
Mini-environment and electrostatic elimination device are equipped as standard.
A set of nanoimprint processes and materials starter-kit will be delivered together with the machine, covering processes for DOE, AR slanted grating, high density, high aspect ratio structures and other applications etc., to enable our customers beginning with world leading level of nanoimprint technology based on our experiences.
Substrate size |
2inch, 100mm, 150mm, 200mm (Special sizes can be customized) |
Substrate material |
Silicon, glass, quartz, plastic, metal, etc. |
Wafer loading & unloading |
Single wafer automatic loading and unloading |
Wafer pre-alignment |
Optical pre-alignment |
Supported NIL process |
UV-NIL with GermanLitho proprietary CLIV (Contact Litho into Vacuum) technology guarantees the accuracy of imprinted structures and replication fidelity. |
Resolution |
Better than 10 nm* |
Aspect ratio |
Better than 10:1* |
Residual layer thickness（RLT） |
Less than 10nm* |
UV curing light source |
High power UV LED panel light source (365nm, light intensity >1000mW/cm2, (2000mw/cm2 optional) |
Mini-environment and climate control |
Standard, external environment class 100, internal environment better than class10* |
Automatic imprinting |
Supported |
Automatic separation |
Supported |
Automatic working stamp replication |
Supported |
Automatic alignment |
Optional |