The GL8 CLlV Gen2 is GermanLitho’s latest semi-automatic, full-field, high-resolution UV nanoimprint equipment.
The proprietary CLIV (Contact Litho into Vacuum) technology guarantees the accuracy and replication fidelity of imprinted structures. The GL8 CLIV Gen2 enables semi-automatic imprinting of high resolution (higher than 10nm*) and high-aspect-ratio (greater than 10: 1*) nanostructures on up to 200mm wafers. The equipment supports automatic replication of flexible composite working stamps, allowing high resolution and a long service life, as well as significantly reducing the cost of large-area molds in nanoimprint processes. The GL8 CLIV Gen2 is suitable for R&D and pilot production of DOEs, AR / VR waveguides (including slanted gratings), WGPs, metalenses, biochips, LED PSSs, MLAs and other applications.
Volume-proven full-filed nanoimprint equipment for high-resolution, high-aspect-ratio nanostructures on up to 200mm wafers.
CLIV imprinting technology guarantees the accuracy and replication fidelity of imprinted structures.
Automatic internal replication of flexible composite working stamp, reducing the cost of large-area molds in nanoimprint processes.
Fully-automatic nanoimprinting processes including working stamp replication, alignment, imprinting, curing and separation.
High power UV LED panel (365nm, light intensity >1000mW/cm2) with water cooling, light sources of different power and wavelength can be provided according to customer specifications, perfectly supporting a variety of commercial nanoimprint materials.
Mini-environment and electrostatic elimination device equipped as standard.
Based on our experiences, we have created nanoimprint process and material starter-kits to be delivered with our products, enabling our customers to immediately make use of the world-leading level of nanoimprint technology.
Substrate size |
2inch, 100mm, 150mm, 200mm (Special sizes can be customized) |
Substrate material |
Silicon, glass, quartz, plastic, metal, etc. |
Wafer loading & unloading |
Single wafer automatic loading and unloading |
Wafer pre-alignment |
Optical pre-alignment |
Supported NIL process |
UV-NIL with GermanLitho proprietary CLIV (Contact Litho into Vacuum) technology guarantees the accuracy of imprinted structures and replication fidelity. |
Resolution |
Higher than 10 nm* |
Aspect ratio |
Greater than 10:1* |
Residual layer thickness（RLT） |
Less than 10nm* |
UV curing light source |
High power UV LED panel light source (365nm, light intensity >1000mW/cm2 , water cooling, (2000mw/cm2 optional) |
Mini-environment and climate control |
Standard, external environment class 100, internal environment better than class10* |
Automatic imprinting |
Supported |
Automatic separation |
Supported |
Automatic working stamp replication |
Supported |
Automatic alignment |
Optional |