Volume-proven fully-automatic 200/300mm nanoimprint lithography mass production system for high resolution, high aspect ratio nanostructures.

CLIV technology ensures the accuracy of imprinted structures and replication fidelity.

Cassette to cassette automatic wafer loading/unloading, optical pre-alignment. 

Automatic flexible composite working stamp replication, automatic working stamp exchange. Suitable for mass production.

Fully-automatic NIL substrate pretreatment processes, including substrate cleaning, spin-coating, baking, cooling, plasma surface treatment (optional) etc.

Fully-automatic nanoimprinting processes, including working stamp replication, alignment, imprinting, curing and separation, etc.

All process steps are carried out in a closed and clean mini-environment to ensure the imprinting quality.

High power UV LED panel light source (365nm, light intensity >1000mW/cm²) with water cooling, possible customization of power and wavelength of the light source, optional post cure module, perfectly support a variety of commercial nanoimprint materials.

Throughput up to 100 wph possible, suitable for large-scale mass production of DOE, AR/VR waveguide (including slanted gratings), WGP, metalens, biochip, LED PSS, MLA and other applications.

A set of nanoimprint processes and materials starter-kit will be delivered together with the machine, covering processes for DOE, AR slanted grating, high density, high aspect ratio structures and other applications etc., to enable our customers beginning with world leading level of nanoimprint technology based on our experiences.