The UniPrinter is a powerful and user-friendly desktop nanoimprint lithography (NIL) equipment designed specifically for universities, research institutes and enterprise R&D activities
It enables imprinting of high-resolution (higher than 10nm*) and high-aspect-ratio (greater than 10: 1*) nanostructures on up to 4-inch wafers. The UniPrinter is suitable for the development of UV nanoimprint lithography processes, rapid device prototyping and nanoimprint material testing. It follows the processes and material system of GermanLitho’s mass production NIL equipment, allowing processes developed on UniPrinter to be efficiently adapted to any of our other mass production devices. The UniPrinter is suitable for R&D of DOEs, AR waveguides (including slanted grating), WGPs, metalenses, biochips, LED PSSs and myriad other applications.
Following the processes and material system of GermanLitho’s mass production nanoimprint equipment, any developed process can be efficiently adapted to the mass production equipment.
Imprinting of high-resolution, high-aspect-ratio nanostructures on up to 100mm wafers.
Automatic internal replication of flexible composite working stamps.
Fully-automatic nanoimprinting processes including working stamp replication, imprinting, curing and separation.
High power UV LED panel (365nm, light intensity >300mW/cm2), perfectly supporting a variety of nanoimprint materials.
Based on our experiences, we have created nanoimprint process and material starter-kits to be delivered with our products, enabling our customers to immediately make use of the world-leading level of nanoimprint technology.
Substrate size |
Up to 100mm wafers (Special sizes can be customized) |
Substrate material |
Silicon, glass, quartz, plastic, metal, etc. |
Supported NIL process |
UV-NIL process, suitable for imprinting of high resolution, high aspect ratio nanostructures |
Resolution |
Higher than 10 nm* |
Aspect ratio |
Greater than 10:1* |
Residual layer thickness（RLT） |
Less than 10nm* |
UV curing light source |
High power UV LED panel light source (365nm, light intensity >300mW/cm2) |
Automatic imprinting |
Supported |
Automatic separation |
Supported |
Automatic working stamp replication |
Supported |
Wafer loading & unloading |
Manual loading/unloading |